Chem. Commun., 2013, Advance Article
DOI: 10.1039/C3CC44217A, Communication
DOI: 10.1039/C3CC44217A, Communication
Hui Wang, Xiangxiang Li, Ping Chen, Min Chen, Xiaoming Zheng
An adsorption-discharge plasma process was proposed for high-efficiency DeNOx in simulated flue gas at a low temperature.
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An adsorption-discharge plasma process was proposed for high-efficiency DeNOx in simulated flue gas at a low temperature.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry